We have compiled a list of manufacturers, distributors, product information, reference prices, and rankings for Small sputtering equipment.
ipros is IPROS GMS ・ IPROS One of the largest technical database sites in Japan that collects information on.

Small sputtering equipment Product List and Ranking from 5 Manufacturers, Suppliers and Companies

Last Updated： Aggregation Period:Sep 24, 2025～Oct 21, 2025
This ranking is based on the number of page views on our site.

Small sputtering equipment Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Sep 24, 2025～Oct 21, 2025
This ranking is based on the number of page views on our site.

  1. マツボー Tokyo//Trading company/Wholesale
  2. アリオス Tokyo//Industrial Machinery
  3. 和泉テック Miyagi//Industrial Machinery
  4. SCREENファインテックソリューションズ Kyoto//Industrial Machinery
  5. 富士アールアンドディー Shizuoka//Industrial Machinery
Go to Company Ranking

Small sputtering equipment Product ranking

Last Updated： Aggregation Period:Sep 24, 2025～Oct 21, 2025
This ranking is based on the number of page views on our site.

  1. Small sputtering device マツボー
  2. Small sputtering device 和泉テック
  3. Small sputtering device 'SS-DC・RF301' アリオス
  4. The ideal small sputtering device for research and prototyping: 'VS-R400G' SCREENファインテックソリューションズ
  5. Experimental small-scale sputtering device 富士アールアンドディー

Small sputtering equipment Product List

1～5 item / All 5 items

Displayed results
Small sputtering device

Small sputtering device

Achieve space-saving with a compact design! An ideal sputtering device for university and private research labs (researcher pricing).

Since its establishment in 1964, South Korea's A-tech has been providing thin film manufacturing equipment tailored to customer needs. The Desktop Pro is a compact, high-performance sputtering device that can be installed on a desktop and offers economic advantages. It is ideal for material property research, product QC and QA, and semiconductor failure analysis. ■ For details, please download the catalog ■ ● Inquiries: 03-5472-1722 (TEL)

  • Sputtering Equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Experimental small-scale sputtering device

Experimental small-scale sputtering device

Three types of targets can be installed! The substrate is automatically transported in a vacuum!

It automatically performs everything from vacuum pumping to substrate transport and sputtering. With its compact design, it is optimal as an experimental device without taking up much space. ~Features~ - The main pump uses a turbo molecular pump. - The sputtering chamber, where the film is deposited, is separated from the chamber where the film is retrieved by a gate valve. After setting the substrate, it is automatically transported in a vacuum. - Up to three types of targets can be installed. - The substrate moves under the targets in the order set, using an automatic rotation mechanism for film deposition.

  • Vacuum Equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Small sputtering device

Small sputtering device

The compatible substrate can be processed up to a maximum of φ1 inch! Equipment equipped with a dual gas nozzle.

The "Compact Sputtering Device" is a laboratory high-vacuum thin film deposition system equipped with a 1.3-inch magnetron sputter cathode. It is equipped with an RF power supply with a matching unit for discharge. It features a dual gas nozzle capable of supporting oxidation reaction sputtering. Additionally, it can process substrates up to a maximum diameter of 1 inch. 【Features】 ■ Equipped with a 1.3-inch magnetron sputter cathode ■ Comes with an RF power supply with a matching unit for discharge ■ Features a dual gas nozzle capable of supporting oxidation reaction sputtering ■ Can process substrates up to a maximum diameter of 1 inch *For more details, please refer to the external link page or feel free to contact us.

  • Sputtering Equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
Small sputtering device 'SS-DC・RF301'

Small sputtering device 'SS-DC・RF301'

Compact design yet maintains performance! A sputtering device capable of substrate heating at high temperatures.

The "SS-DC・RF301" is a compact sputtering device equipped with one 2" magnetron cathode and a substrate heating mechanism. Thanks to its simple design, it can be installed in about half the space of an office desk. It employs a substrate up-and-down mechanism, allowing for adjustable distance between the target and the substrate. In addition to being able to heat the substrate at high temperatures, it can also operate using only electricity and gas, and allows for reconfiguration between sputter-up and sputter-down. 【Features】 ■ Space-saving with a simple design ■ Adjustable distance between the target and the substrate ■ Capable of high-temperature substrate heating ■ Standard equipped with a chiller *For more details, please refer to the catalog. Feel free to contact us with any inquiries.

  • Sputtering Equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
The ideal small sputtering device for research and prototyping: 'VS-R400G'

The ideal small sputtering device for research and prototyping: 'VS-R400G'

Ideal for experiments, research, evaluation, and prototype production! Achieving high-speed, high-precision, low-damage vacuum deposition on flat substrates such as glass and metal!

The "VS-R400G" is a sputtering device that adopts a unique LIA (Low Inductance Antenna) plasma source, achieving ultra-fast and high-quality vacuum deposition. Thanks to the assist effect of the LIA method's inductively coupled plasma (LIA-ICP), it reduces damage without lowering the deposition speed, resulting in high-quality film formation. Additionally, it can also accommodate reactive sputtering by leveraging the characteristics of high-density plasma. 【Features】 ■ A sputtering device suitable for experiments, research, evaluation, and prototyping ■ Reduces damage without lowering deposition speed, achieving high-quality film formation ■ Capable of reactive sputtering by utilizing the characteristics of high-density plasma ■ Enables faster deposition speeds by incorporating a rotary cathode ■ Easy to expand into production machines *For more details, please refer to the related links or feel free to contact us.

  • Sputtering Equipment

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration
COPYRIGHT © 2001-2025 IPROS CORPORATION ALL RIGHTS RESERVED.